New high fill-factor triangular micro-lens array fabrication method using UV proximity printing

Abstract

A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated the high fill-factor triangular microlens array in photoresist. It is due to the UV light diffraction to deflect away from the aperture edges and produce a certain exposure in photoresist material outside the aperture edges. This method can precisely control the geometric profile of high fill factor triangular microlens array. The experimental results showed that the triangular micro-lens array in photoresist could be formed automatically when the printing gap ranged from 240 μm to 840 μm. The gapless triangular microlens array will be used to increases of luminance for backlight module of liquid crystal displays.